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"Simulation-enabled development lot journey smoothening in a fully-utilised ..."

Wolfgang Scholl et al. (2016)

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DOI: 10.1109/WSC.2016.7822294

access: closed

type: Conference or Workshop Paper

metadata version: 2021-06-10

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  - https://dblp.org/rec/conf/wsc/SchollFPNGL16
Wolfgang Scholl, Matthias Forster, Patrick Preuss, André Naumann, Boon-Ping Gan, Peter Lendermann:
Simulation-enabled development lot journey smoothening in a fully-utilised semiconductor manufacturing line. WSC 2016: 2559-2567

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