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"Towards low damage and fab-compatible top-contacts in MX2 transistors ..."

Shreya Kundu et al. (2023)

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DOI: 10.23919/VLSITECHNOLOGYANDCIR57934.2023.10185413

access: closed

type: Conference or Workshop Paper

metadata version: 2024-05-29

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Shreya Kundu, D. H. van Doip, Tom Schram, Quentin Smets, S. Banerjee, Benjamin Groven, Daire Cott, S. Decoster, P. Bezard, F. Lazzarino, K. Banerjee, Souvik Ghosh, J. F. de Mamelfe, Pierre Morin, Cesar J. Lockhart de la Rosa, Inge Asselberghs, Gouri Sankar Kar:
Towards low damage and fab-compatible top-contacts in MX2 transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach. VLSI Technology and Circuits 2023: 1-2

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