"Double Patterning Lithography (DPL)-compliant layout construction (DCLC) ..."

Debasis Pal et al. (2016)

> Home

Details and statistics

DOI: 10.1109/ISVDAT.2016.8064875

access: closed

type: Conference or Workshop Paper

metadata version: 2018-01-23

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/vdat/PalPDD16
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/vdat/PalPDD16
Debasis Pal, Abir Pramanik, Parthasarathi Dasgupta, Debesh Kumar Das:
Double Patterning Lithography (DPL)-compliant layout construction (DCLC) with area-stitch usage tradeoff. VDAT 2016: 1-6

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.