"Plasma etch process virtual metrology using aggregative linear regression."

PKS Prakash, Seán F. McLoone (2011)

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DOI: 10.1109/SOCPAR.2011.6089153

access: closed

type: Conference or Workshop Paper

metadata version: 2020-09-03

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PKS Prakash, Seán F. McLoone:
Plasma etch process virtual metrology using aggregative linear regression. SoCPaR 2011: 538-543

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