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"High aspect ratio etching of nanopores in PECVD SiC through AAO mask."

Songmei Wu et al. (2013)

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DOI: 10.1109/NEMS.2013.6559887

access: closed

type: Conference or Workshop Paper

metadata version: 2023-09-30

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  dblp key:
  - conf/nems/WuBTAZB13
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  - https://dblp.org/rec/conf/nems/WuBTAZB13
Songmei Wu, M.-O. Bammatter, Wei Tang, V. Auzelyte, Haixia Zhang, Juergen Brugger:
High aspect ratio etching of nanopores in PECVD SiC through AAO mask. NEMS 2013: 986-989

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