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"Electrical Masking Improvement with Standard Logic Cell Synthesis Using 45 ..."

Semiu A. Olowogemo et al. (2020)

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DOI: 10.1109/MWSCAS48704.2020.9184651

access: closed

type: Conference or Workshop Paper

metadata version: 2021-09-23

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  - conf/mwscas/OlowogemoYLQRL20
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  - https://dblp.org/rec/conf/mwscas/OlowogemoYLQRL20
Semiu A. Olowogemo, Ahmed Yiwere, Bor-Tyng Lin, Hao Qiu, William H. Robinson, Daniel B. Limbrick:
Electrical Masking Improvement with Standard Logic Cell Synthesis Using 45 nm Technology Node. MWSCAS 2020: 619-622

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