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"Run-to-Run Control of Thermal Atomic Layer Deposition."

Yichi Zhang et al. (2020)

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DOI: 10.1109/MED48518.2020.9183059

access: closed

type: Conference or Workshop Paper

metadata version: 2024-01-19

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Yichi Zhang, Yangyao Ding, Zhe Wu, Panagiotis D. Christofides:
Run-to-Run Control of Thermal Atomic Layer Deposition. MED 2020: 1080-1086

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