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"Conduction and Breakdown Mechanisms in Low-k Spacer and Nitride Spacer ..."

Chen Wu et al. (2020)

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DOI: 10.1109/IRPS45951.2020.9128328

access: closed

type: Conference or Workshop Paper

metadata version: 2023-05-24

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Chen Wu, Adrian Vaisman Chasin, Steven Demuynck, Naoto Horiguchi, Kris Croes:
Conduction and Breakdown Mechanisms in Low-k Spacer and Nitride Spacer Dielectric Stacks in Middle of Line Interconnects. IRPS 2020: 1-6

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