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"Reliability of Ferroelectric and Antiferroelectric Si: HfO2 materials in ..."

A. Viegas et al. (2022)

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DOI: 10.1109/IRPS48227.2022.9764517

access: closed

type: Conference or Workshop Paper

metadata version: 2023-06-16

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  dblp key:
  - conf/irps/ViegasFAKHMCH22
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A. Viegas, K. Falidas, T. Ali, Kati Kühnel, R. Hoffmann, Clemens Mart, M. Czernohorsky, J. Heitmann:
Reliability of Ferroelectric and Antiferroelectric Si: HfO2 materials in 3D capacitors by TDDB studies. IRPS 2022: 47-1

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