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"Constant voltage electromigration for advanced BEOL copper interconnects."

Baojun Tang et al. (2015)

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DOI: 10.1109/IRPS.2015.7112685

access: closed

type: Conference or Workshop Paper

metadata version: 2022-12-02

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  - conf/irps/TangCJBTWWM15
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  - https://dblp.org/rec/conf/irps/TangCJBTWWM15
Baojun Tang, Kris Croes, Nicolas Jourdan, Jürgen Bömmels, Zsolt Tökei, Ingrid De Wolf, Eric Wilcox, Timothy McMullen:
Constant voltage electromigration for advanced BEOL copper interconnects. IRPS 2015: 2

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