"Impact of Bi-Layer Gate Stack and Thickness on Low Frequency TDDB in ..."

Kartika Chandra Sahoo et al. (2025)

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DOI: 10.1109/IRPS48204.2025.10982768

access: closed

type: Conference or Workshop Paper

metadata version: 2025-06-04

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Kartika Chandra Sahoo, Rakesh Ranjan, Ki-Don Lee, Junehwan Jonathan Kim, Robert Moeller, Pavitra Ramadevi Perepa, John A. Frerich, Ju Kwang Kim, Dung Dau, Mukyeng Jung:
Impact of Bi-Layer Gate Stack and Thickness on Low Frequency TDDB in FinFET and Planar Devices. IRPS 2025: 29

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