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"Reliability of an Al2O3/SiO2MIM Capacitor for 180nm (3.3V) Technology."
Jeff Gambino et al. (2019)
- Jeff Gambino, Derryl D. J. Allman, Gavin D. R. Hall, D. Price, L. Sheng, R. Takada, Y. Kanuma:
Reliability of an Al2O3/SiO2MIM Capacitor for 180nm (3.3V) Technology. IRPS 2019: 1-5
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