"eNVM RRAM reliability performance and modeling in 22FFL FinFET technology."

Yao-Feng Chang et al. (2020)

> Home

Details and statistics

DOI: 10.1109/IRPS45951.2020.9128359

access: closed

type: Conference or Workshop Paper

metadata version: 2020-07-30

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/irps/ChangOAKCQSGCH20
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/irps/ChangOAKCQSGCH20
Yao-Feng Chang, James A. O'Donnell, Tony Acosta, Roza Kotlyar, Albert B. Chen, Pedro A. Quintero, Nathan Strutt, Oleg Golonzka, Chris Connor, Jeff Hicks:
eNVM RRAM reliability performance and modeling in 22FFL FinFET technology. IRPS 2020: 1-4

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.