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"A DFM tool for analyzing lithography and stress effects on standard cells ..."

Rami F. Salem et al. (2010)

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DOI: 10.1109/IDT.2010.5724398

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-24

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Rami F. Salem, Abdelrahman ElMously, Haitham Eissa, Mohamed Dessouky, Mohab H. Anis:
A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs. IDT 2010: 13-17

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