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"Defect prediction for reactive ion etching using neural networks."

D. Stokes et al. (1997)

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DOI: 10.1109/ICNN.1997.611658

access: closed

type: Conference or Workshop Paper

metadata version: 2019-08-23

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  dblp key:
  - conf/icnn/StokesMCL97
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  - https://dblp.org/rec/conf/icnn/StokesMCL97
D. Stokes, Gary May, V. Chen, Y. T. Lin:
Defect prediction for reactive ion etching using neural networks. ICNN 1997: 169-173

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