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"An Advanced Model for Dopant Diffusion in Polycrystalline silicon during ..."

Salah Abadli, Farida Mansour (2006)

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DOI: 10.1109/ICMENS.2006.348206

access: closed

type: Conference or Workshop Paper

metadata version: 2017-05-25

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Salah Abadli, Farida Mansour:
An Advanced Model for Dopant Diffusion in Polycrystalline silicon during rapid thermal annealing. ICMENS 2006: 11-14

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