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"Influence of Y2O3 Doped HfO2 High-k Films on Electrical Properties of MOS ..."
Chih-Feng Yen et al. (2022)
- Chih-Feng Yen, Yu-Ya Huang, Shen-Hao Tsao, Shih-Hao Lin, Chun-Hu Cheng:
Influence of Y2O3 Doped HfO2 High-k Films on Electrical Properties of MOS and MIM Devices. ICKII 2022: 225-229
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