"Patterns of Exposing Integrity of 28nm-node High-k Gate Dielectric on ..."

Si-Ping Li et al. (2020)

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DOI: 10.1109/ICKII50300.2020.9318785

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type: Conference or Workshop Paper

metadata version: 2022-10-02

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Si-Ping Li, Jia-Wei Xu, Wei-Hao Li, Jian-Ming Chen, Chao-Nan Wei, Wen-How Lan, Mu-Chun Wang:
Patterns of Exposing Integrity of 28nm-node High-k Gate Dielectric on p-substrate with Nitridation Treatments. ICKII 2020: 67-70

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