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"Patterns of Exposing Integrity of 28nm-node High-k Gate Dielectric on ..."
Si-Ping Li et al. (2020)
- Si-Ping Li, Jia-Wei Xu, Wei-Hao Li, Jian-Ming Chen, Chao-Nan Wei, Wen-How Lan, Mu-Chun Wang
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Patterns of Exposing Integrity of 28nm-node High-k Gate Dielectric on p-substrate with Nitridation Treatments. ICKII 2020: 67-70
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