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"Stochastic gradient descent for robust inverse photomask synthesis in ..."

Ningning Jia, Edmund Y. Lam (2010)

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DOI: 10.1109/ICIP.2010.5653690

access: closed

type: Conference or Workshop Paper

metadata version: 2019-09-16

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Ningning Jia, Edmund Y. Lam:
Stochastic gradient descent for robust inverse photomask synthesis in optical lithography. ICIP 2010: 4173-4176

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