


default search action
"FD-SOI material enabling CMOS technology disruption from 65nm to 12nm and ..."
Walter Schwarzenbach et al. (2017)
- Walter Schwarzenbach, Manuel Sellier, Bich-Yen Nguyen, Christophe Girard, Christophe Maleville:

FD-SOI material enabling CMOS technology disruption from 65nm to 12nm and beyond. ICICDT 2017: 1-2

manage site settings
To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.


Google
Google Scholar
Semantic Scholar
Internet Archive Scholar
CiteSeerX
ORCID













