Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Design of CMOS Device Process Sensor in 28 nm FD-SOI with 2 % of Frequency ..."

Gowtham Peringattu Kalarikkal, Rohit Goel, Hitesh Shrimali (2021)

> Home

Details and statistics

DOI: 10.1109/ICECS53924.2021.9665465

access: closed

type: Conference or Workshop Paper

metadata version: 2022-01-14

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/icecsys/KalarikkalGS21
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/icecsys/KalarikkalGS21
Gowtham Peringattu Kalarikkal, Rohit Goel, Hitesh Shrimali:
Design of CMOS Device Process Sensor in 28 nm FD-SOI with 2 % of Frequency Spread. ICECS 2021: 1-6

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.