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"A fast process variation and pattern fidelity aware mask optimization ..."

Ahmed Awad et al. (2014)

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DOI: 10.1109/ICCAD.2014.7001358

access: closed

type: Conference or Workshop Paper

metadata version: 2023-05-01

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  dblp key:
  - conf/iccad/AwadTTK14
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  persistent URL:
  - https://dblp.org/rec/conf/iccad/AwadTTK14
Ahmed Awad, Atsushi Takahashi, Satoshi Tanaka, Chikaaki Kodama:
A fast process variation and pattern fidelity aware mask optimization algorithm. ICCAD 2014: 238-245

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