Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Equipment design and process control of critical dimensions in lithography."

Yit Sung Ngo et al. (2010)

> Home

Details and statistics

DOI: 10.1109/ICCA.2010.5524378

access: closed

type: Conference or Workshop Paper

metadata version: 2020-10-25

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - conf/icca/NgoYPATF10
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/conf/icca/NgoYPATF10
Yit Sung Ngo, Geng Yang, Andi Sudjana Putra, Kar Tien Ang, Arthur Tay, Zhong Ping Fang:
Equipment design and process control of critical dimensions in lithography. ICCA 2010: 1572-1577

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.