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"Impact of high resolution lithography on IC mask design."

Graham Pugh, John Canning, Bernie Roman (1998)

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DOI: 10.1109/CICC.1998.694925

access: closed

type: Conference or Workshop Paper

metadata version: 2023-09-30

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  - conf/cicc/PughCR98
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  - https://dblp.org/rec/conf/cicc/PughCR98
Graham Pugh, John Canning, Bernie Roman:
Impact of high resolution lithography on IC mask design. CICC 1998: 149-153

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