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"A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness ..."

Zhen Geng et al. (2013)

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DOI: 10.1109/CADGRAPHICS.2013.16

access: closed

type: Conference or Workshop Paper

metadata version: 2023-07-28

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  dblp key:
  - conf/cadgraphics/GengSYL13
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  persistent URL:
  - https://dblp.org/rec/conf/cadgraphics/GengSYL13
Zhen Geng, Zheng Shi, Xiaolang Yan, Kai-sheng Luo:
A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness Improvement with Attenuated Phase Shift Mask. CAD/Graphics 2013: 68-73

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