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"3D thermal modeling of a plasma assisted chemical vapor deposition process."

S. Rouquette et al. (2002)

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DOI: 10.1109/ACC.2002.1024522

access: closed

type: Conference or Workshop Paper

metadata version: 2022-10-02

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  dblp key:
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S. Rouquette, Laurent Autrique, C. Chaussavoine, L. Thomas:
3D thermal modeling of a plasma assisted chemical vapor deposition process. ACC 2002: 3813-3816

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