BibTeX record journals/ibmrd/MedeirosAGHKMMMPA01

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@article{DBLP:journals/ibmrd/MedeirosAGHKMMMPA01,
  author       = {David R. Medeiros and
                  Ari Aviram and
                  C. Richard Guarnieri and
                  Wu{-}Song Huang and
                  Ranee Kwong and
                  Christopher K. Magg and
                  Arpan P. Mahorowala and
                  Wayne M. Moreau and
                  Karen E. Petrillo and
                  Marie Angelopoulos},
  title        = {Recent progress in electron-beam resists for advaced mask-making},
  journal      = {{IBM} J. Res. Dev.},
  volume       = {45},
  number       = {5},
  pages        = {639--650},
  year         = {2001},
  url          = {https://doi.org/10.1147/rd.455.0639},
  doi          = {10.1147/RD.455.0639},
  timestamp    = {Fri, 13 Mar 2020 10:54:29 +0100},
  biburl       = {https://dblp.org/rec/journals/ibmrd/MedeirosAGHKMMMPA01.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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