BibTeX record conf/ispd/LinWKMN0P18

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@inproceedings{DBLP:conf/ispd/LinWKMN0P18,
  author       = {Yibo Lin and
                  Yuki Watanabe and
                  Taiki Kimura and
                  Tetsuaki Matsunawa and
                  Shigeki Nojima and
                  Meng Li and
                  David Z. Pan},
  editor       = {Chris Chu and
                  Ismail Bustany},
  title        = {Data Efficient Lithography Modeling with Residual Neural Networks
                  and Transfer Learning},
  booktitle    = {Proceedings of the 2018 International Symposium on Physical Design,
                  {ISPD} 2018, Monterey, CA, USA, March 25-28, 2018},
  pages        = {82--89},
  publisher    = {{ACM}},
  year         = {2018},
  url          = {https://doi.org/10.1145/3177540.3178242},
  doi          = {10.1145/3177540.3178242},
  timestamp    = {Wed, 21 Nov 2018 12:44:10 +0100},
  biburl       = {https://dblp.org/rec/conf/ispd/LinWKMN0P18.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}