BibTeX record conf/irps/KishidaOK15

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@inproceedings{DBLP:conf/irps/KishidaOK15,
  author       = {Ryo Kishida and
                  Azusa Oshima and
                  Kazutoshi Kobayashi},
  title        = {Negative bias temperature instability caused by plasma induced damage
                  in 65 nm bulk and Silicon on thin {BOX} {(SOTB)} processes},
  booktitle    = {{IEEE} International Reliability Physics Symposium, {IRPS} 2015, Monterey,
                  CA, USA, April 19-23, 2015},
  pages        = {2},
  publisher    = {{IEEE}},
  year         = {2015},
  url          = {https://doi.org/10.1109/IRPS.2015.7112780},
  doi          = {10.1109/IRPS.2015.7112780},
  timestamp    = {Wed, 16 Oct 2019 14:14:55 +0200},
  biburl       = {https://dblp.org/rec/conf/irps/KishidaOK15.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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