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Yu. Lebedinskii

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2007
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Yu. Lebedinskii, A. V. Zenkevich:
Effective work function of NiSi/HfO₂ gate stacks measured with X-ray photoelectron spectroscopy. Microelectron. Reliab. 47(4-5): 649-652 (2007)
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Andrei Zenkevich, Yu. Lebedinskii, G. Scarel, Marco Fanciulli, Andrey Baturin, N. Lubovin:
Degradation kinetics of ultrathin HfO₂ layers on Si(1 0 0) during vacuum annealing monitored with in situ XPS/LEIS and ex situ AFM. Microelectron. Reliab. 47(4-5): 657-659 (2007)

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