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Aaron Thean
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Publications
- 2017
- [j2]Trong Huynh Bao, Julien Ryckaert, Zsolt Tokei, Abdelkarim Mercha, Diederik Verkest, Aaron Voon-Yew Thean, Piet Wambacq:
Statistical Timing Analysis Considering Device and Interconnect Variability for BEOL Requirements in the 5-nm Node and Beyond. IEEE Trans. Very Large Scale Integr. Syst. 25(5): 1669-1680 (2017) - 2015
- [c24]Bertrand Parvais, Piet Wambacq, Abdelkarim Mercha, Diederik Verkest, Aaron Thean, Ken Sawada, Kazuki Nomoto, Tetsuya Oishi, Hiroaki Ammo:
A digital intensive circuit for low-frequency noise monitoring in 28nm CMOS. A-SSCC 2015: 1-4 - [c23]Praveen Raghavan, Marie Garcia Bardon, Doyoung Jang, P. Schuddinck, Dmitry Yakimets, Julien Ryckaert, Abdelkarim Mercha, Naoto Horiguchi, Nadine Collaert, Anda Mocuta, Dan Mocuta, Zsolt Tokei, Diederik Verkest, Aaron Thean, An Steegen:
Holisitic device exploration for 7nm node. CICC 2015: 1-5 - [c21]Trong Huynh Bao, Sushil Sakhare, Julien Ryckaert, Dmitry Yakimets, Abdelkarim Mercha, Diederik Verkest, Aaron Voon-Yew Thean, Piet Wambacq:
Design technology co-optimization for enabling 5nm gate-all-around nanowire 6T SRAM. ICICDT 2015: 1-4 - [c20]Marie Garcia Bardon, P. Schuddinck, Praveen Raghavan, Doyoung Jang, Dmitry Yakimets, Abdelkarim Mercha, Diederik Verkest, Aaron Thean:
Dimensioning for power and performance under 10nm: The limits of FinFETs scaling. ICICDT 2015: 1-4 - [c18]Nathalie Fievet, Praveen Raghavan, Rogier Baert, Frédéric Robert, Abdelkarim Mercha, Diederik Verkest, Aaron Thean:
Impact of device and interconnect process variability on clock distribution. ICICDT 2015: 1-4 - [c17]Kenichi Miyaguchi, Bertrand Parvais, Lars-Åke Ragnarsson, Piet Wambacq, Praveen Raghavan, Abdelkarim Mercha, Anda Mocuta, Diederik Verkest, Aaron Thean:
Modeling FinFET metal gate stack resistance for 14nm node and beyond. ICICDT 2015: 1-4 - [c13]Kazuyuki Tomida, Keizo Hiraga, Morin Dehan, Geert Hellings, Doyoung Jang, Kenichi Miyaguchi, Thomas Chiarella, Minsoo Kim, Anda Mocuta, Naoto Horiguchi, Abdelkarim Mercha, Diederik Verkest, Aaron Thean:
Impact of fin shape variability on device performance towards 10nm node. ICICDT 2015: 1-4 - [c12]Dmitry Yakimets, Doyoung Jang, Praveen Raghavan, Geert Eneman, Hans Mertens, P. Schuddinck, Arindam Mallik, Marie Garcia Bardon, Nadine Collaert, Abdelkarim Mercha, Diederik Verkest, Aaron Thean, Kristin De Meyer:
Lateral NWFET optimization for beyond 7nm nodes. ICICDT 2015: 1-4 - 2014
- [c6]Julien Ryckaert, Praveen Raghavan, Rogier Baert, Marie Garcia Bardon, Mircea Dusa, Arindam Mallik, Sushil Sakhare, Boris Vandewalle, Piet Wambacq, Bharani Chava, Kris Croes, Morin Dehan, Doyoung Jang, Philippe Leray, Tsung-Te Liu, Kenichi Miyaguchi, Bertrand Parvais, Pieter Schuddinck, Philippe Weemaes, Abdelkarim Mercha, Jürgen Bömmels, Naoto Horiguchi, Greg McIntyre, Aaron Thean, Zsolt Tökei, Shaunee Cheng, Diederik Verkest, An Steegen:
Design Technology co-optimization for N10. CICC 2014: 1-8 - [c5]Trong Huynh Bao, Dmitry Yakimets, Julien Ryckaert, Ivan Ciofi, Rogier Baert, Anabela Veloso, Jürgen Bömmels, Nadine Collaert, Philippe Roussel, S. Demuynck, Praveen Raghavan, Abdelkarim Mercha, Zsolt Tokei, Diederik Verkest, Aaron Thean, Piet Wambacq:
Circuit and process co-design with vertical gate-all-around nanowire FET technology to extend CMOS scaling for 5nm and beyond technologies. ESSDERC 2014: 102-105
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