BibTeX records: Dina H. Triyoso

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@inproceedings{DBLP:conf/drc/RanaBRTSJPSZRKM19,
  author    = {U. Rana and
               D. P. Brunco and
               S. Raman and
               Dina H. Triyoso and
               M. W. Stoker and
               J. B. Johnson and
               Luigi Pantisano and
               K. D. Seo and
               M. Zhao and
               A. Reznicek and
               R. Krishnan and
               B. Moser and
               J. Freeman and
               L. Jang and
               E. Kaganer},
  title     = {High Performance and Yield for Super Steep Retrograde Wells {(SSRW)}
               by Well Implant / Si-based Epitaxy on Advanced Technology FinFETs},
  booktitle = {Device Research Conference, {DRC} 2019, Ann Arbor, MI, USA, June 23-26,
               2019},
  pages     = {251--252},
  publisher = {{IEEE}},
  year      = {2019},
  url       = {https://doi.org/10.1109/DRC46940.2019.9046440},
  doi       = {10.1109/DRC46940.2019.9046440},
  timestamp = {Fri, 03 Apr 2020 11:59:13 +0200},
  biburl    = {https://dblp.org/rec/conf/drc/RanaBRTSJPSZRKM19.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/icicdt/TriyosoMHTKKKMH17,
  author    = {D. H. Triyoso and
               G. R. Mulfinger and
               K. Hempel and
               H. Tao and
               F. Koehler and
               L. Kang and
               A. Kumar and
               T. McArdle and
               J. Holt and
               A. L. Child and
               S. Straub and
               F. Ludwig and
               Z. Chen and
               J. Kluth and
               Rick Carter},
  title     = {Characterization of atomic layer deposited low-k spacer for {FDSOI}
               high-k metal gate transistor},
  booktitle = {2017 {IEEE} International Conference on {IC} Design and Technology,
               {ICICDT} 2017, Austin, TX, USA, May 23-25, 2017},
  pages     = {1--4},
  publisher = {{IEEE}},
  year      = {2017},
  url       = {https://doi.org/10.1109/ICICDT.2017.7993500},
  doi       = {10.1109/ICICDT.2017.7993500},
  timestamp = {Wed, 16 Oct 2019 14:14:54 +0200},
  biburl    = {https://dblp.org/rec/conf/icicdt/TriyosoMHTKKKMH17.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/icicdt/TriyosoCKHGKKMJ16,
  author    = {D. H. Triyoso and
               Rick Carter and
               J. Kluth and
               K. Hempel and
               M. Gribelyuk and
               L. Kang and
               A. Kumar and
               B. Mulfinger and
               P. Javorka and
               K. Punchihewa and
               A. Child and
               T. McArdle and
               J. Holt and
               S. Straub and
               R. Sporer and
               P. Chen},
  title     = {Extending {HKMG} scaling on {CMOS} with {FDSOI:} Advantages and integration
               challenges},
  booktitle = {International Conference on {IC} Design and Technology, {ICICDT} 2016,
               Ho Chi Minh, Vietnam, June 27-29, 2016},
  pages     = {1--4},
  publisher = {{IEEE}},
  year      = {2016},
  url       = {https://doi.org/10.1109/ICICDT.2016.7542058},
  doi       = {10.1109/ICICDT.2016.7542058},
  timestamp = {Wed, 16 Oct 2019 14:14:54 +0200},
  biburl    = {https://dblp.org/rec/conf/icicdt/TriyosoCKHGKKMJ16.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/icicdt/WeinreichSPDGNC16,
  author    = {Wenke Weinreich and
               Konrad Seidel and
               Patrick Polakowski and
               Maximilian Drescher and
               A. Gummenscheimer and
               Mark G. Nolan and
               L. Cheng and
               D. H. Triyoso},
  title     = {La-doped ZrO2 based BEoL decoupling capacitors},
  booktitle = {International Conference on {IC} Design and Technology, {ICICDT} 2016,
               Ho Chi Minh, Vietnam, June 27-29, 2016},
  pages     = {1--4},
  publisher = {{IEEE}},
  year      = {2016},
  url       = {https://doi.org/10.1109/ICICDT.2016.7542062},
  doi       = {10.1109/ICICDT.2016.7542062},
  timestamp = {Thu, 09 Jul 2020 01:00:00 +0200},
  biburl    = {https://dblp.org/rec/conf/icicdt/WeinreichSPDGNC16.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/icicdt/TriyosoWSNPUODW14,
  author    = {D. H. Triyoso and
               Wenke Weinreich and
               Konrad Seidel and
               Mark G. Nolan and
               Patrick Polakowski and
               D. Utess and
               S. Ohsiek and
               K. Dittmar and
               M. Weisheit and
               M. Licbau and
               R. Fox},
  title     = {{ALD} Ta2O5 and Hf-doped Ta2O5 for {BEOL} compatible {MIM}},
  booktitle = {2014 {IEEE} International Conference on {IC} Design {\&} Technology,
               {ICICDT} 2014, Austin, TX, USA, May 28-30, 2014},
  pages     = {1--4},
  publisher = {{IEEE}},
  year      = {2014},
  url       = {https://doi.org/10.1109/ICICDT.2014.6838595},
  doi       = {10.1109/ICICDT.2014.6838595},
  timestamp = {Wed, 16 Oct 2019 14:14:54 +0200},
  biburl    = {https://dblp.org/rec/conf/icicdt/TriyosoWSNPUODW14.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/icicdt/WeinreichSPRWTN14,
  author    = {Wenke Weinreich and
               Konrad Seidel and
               Patrick Polakowski and
               Stefan Riedel and
               Lutz Wilde and
               Dina H. Triyoso and
               Mark G. Nolan},
  title     = {{ALD} ZrO2 processes for BEoL device applications},
  booktitle = {2014 {IEEE} International Conference on {IC} Design {\&} Technology,
               {ICICDT} 2014, Austin, TX, USA, May 28-30, 2014},
  pages     = {1--4},
  publisher = {{IEEE}},
  year      = {2014},
  url       = {https://doi.org/10.1109/ICICDT.2014.6838604},
  doi       = {10.1109/ICICDT.2014.6838604},
  timestamp = {Wed, 16 Oct 2019 14:14:54 +0200},
  biburl    = {https://dblp.org/rec/conf/icicdt/WeinreichSPRWTN14.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/icicdt/TriyosoHOSSL13,
  author    = {D. H. Triyoso and
               K. Hempel and
               S. Ohsiek and
               J. Shu and
               J. K. Schaeffer and
               M. Lenski},
  title     = {Impact of precursors choice on characteristics of {PEALD} SiN for
               spacer applications},
  booktitle = {Proceedings of 2013 International Conference on {IC} Design {\&}
               Technology, {ICICDT} 2013, Pavia, Italy, May 29-31, 2013},
  pages     = {69--72},
  publisher = {{IEEE}},
  year      = {2013},
  url       = {https://doi.org/10.1109/ICICDT.2013.6563305},
  doi       = {10.1109/ICICDT.2013.6563305},
  timestamp = {Wed, 16 Oct 2019 14:14:54 +0200},
  biburl    = {https://dblp.org/rec/conf/icicdt/TriyosoHOSSL13.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
@inproceedings{DBLP:conf/icicdt/TriyosoJSMHSL12,
  author    = {D. H. Triyoso and
               V. Jaschke and
               J. Shu and
               S. Mutas and
               K. Hempel and
               J. K. Schaeffer and
               M. Lenski},
  title     = {Robust {PEALD} SiN spacer for gate first high-k metal gate integration},
  booktitle = {{IEEE} International Conference on {IC} Design {\&} Technology,
               {ICICDT} 2012, Austin, TX, USA, May 30 - June 1, 2012},
  pages     = {1--4},
  publisher = {{IEEE}},
  year      = {2012},
  url       = {https://doi.org/10.1109/ICICDT.2012.6232870},
  doi       = {10.1109/ICICDT.2012.6232870},
  timestamp = {Wed, 16 Oct 2019 14:14:54 +0200},
  biburl    = {https://dblp.org/rec/conf/icicdt/TriyosoJSMHSL12.bib},
  bibsource = {dblp computer science bibliography, https://dblp.org}
}
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