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BibTeX records: K. Hempel
@inproceedings{DBLP:conf/icicdt/TriyosoMHTKKKMH17, author = {D. H. Triyoso and G. R. Mulfinger and K. Hempel and H. Tao and F. Koehler and L. Kang and A. Kumar and T. McArdle and J. Holt and A. L. Child and S. Straub and F. Ludwig and Z. Chen and J. Kluth and Rick Carter}, title = {Characterization of atomic layer deposited low-k spacer for {FDSOI} high-k metal gate transistor}, booktitle = {2017 {IEEE} International Conference on {IC} Design and Technology, {ICICDT} 2017, Austin, TX, USA, May 23-25, 2017}, pages = {1--4}, publisher = {{IEEE}}, year = {2017}, url = {https://doi.org/10.1109/ICICDT.2017.7993500}, doi = {10.1109/ICICDT.2017.7993500}, timestamp = {Sat, 30 Sep 2023 01:00:00 +0200}, biburl = {https://dblp.org/rec/conf/icicdt/TriyosoMHTKKKMH17.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
@inproceedings{DBLP:conf/icicdt/TriyosoCKHGKKMJ16, author = {D. H. Triyoso and Rick Carter and J. Kluth and K. Hempel and M. Gribelyuk and L. Kang and A. Kumar and B. Mulfinger and P. Javorka and K. Punchihewa and A. Child and T. McArdle and J. Holt and S. Straub and R. Sporer and P. Chen}, title = {Extending {HKMG} scaling on {CMOS} with {FDSOI:} Advantages and integration challenges}, booktitle = {International Conference on {IC} Design and Technology, {ICICDT} 2016, Ho Chi Minh, Vietnam, June 27-29, 2016}, pages = {1--4}, publisher = {{IEEE}}, year = {2016}, url = {https://doi.org/10.1109/ICICDT.2016.7542058}, doi = {10.1109/ICICDT.2016.7542058}, timestamp = {Sat, 30 Sep 2023 01:00:00 +0200}, biburl = {https://dblp.org/rec/conf/icicdt/TriyosoCKHGKKMJ16.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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