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BibTeX record conf/aspdac/LinYZ0AP16
@inproceedings{DBLP:conf/aspdac/LinYZ0AP16, author = {Yibo Lin and Bei Yu and Yi Zou and Zhuo Li and Charles J. Alpert and David Z. Pan}, title = {Stitch aware detailed placement for multiple e-beam lithography}, booktitle = {21st Asia and South Pacific Design Automation Conference, {ASP-DAC} 2016, Macao, Macao, January 25-28, 2016}, pages = {186--191}, publisher = {{IEEE}}, year = {2016}, url = {https://doi.org/10.1109/ASPDAC.2016.7428009}, doi = {10.1109/ASPDAC.2016.7428009}, timestamp = {Wed, 16 Oct 2019 14:14:52 +0200}, biburl = {https://dblp.org/rec/conf/aspdac/LinYZ0AP16.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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